| Numéro |
J. Phys. France
Volume 44, Numéro 6, juin 1983
|
|
|---|---|---|
| Page(s) | 707 - 711 | |
| DOI | https://doi.org/10.1051/jphys:01983004406070700 | |
J. Phys. France 44, 707-711 (1983)
DOI: 10.1051/jphys:01983004406070700
1 IBM T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, N.Y. 10598, U.S.A.
2 Permanent address : Dept. de Physique, Université de Marseille-Luminy, Case 901, 13288 Marseille Cedex 09, France.
6835B - Structure of clean surfaces (reconstruction).
7320H - Impurity and defect levels; energy states of adsorbed species.
Key words
adhesion -- adsorption -- elemental semiconductors -- gold -- monolayers -- oxidation -- silicon -- silver -- surface electron states
DOI: 10.1051/jphys:01983004406070700
Silicon surfaces : metallic character, oxidation and adhesion
A. Cros1, 21 IBM T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, N.Y. 10598, U.S.A.
2 Permanent address : Dept. de Physique, Université de Marseille-Luminy, Case 901, 13288 Marseille Cedex 09, France.
Abstract
The existence of an ordered or disordered noble metal (Ag, Au) monolayer on the Si(111) surface has a great influence on the growth mode of metal atoms and the oxidation of the silicon surface atoms. These phenomena are discussed and it is suggested that they are both correlated to the more or less pronounced metallic character of the surface.
Résumé
L'existence d'une monocouche métallique (Ag, Au) ordonnée ou désordonnée sur la surface (111) du silicium a une grande influence sur le mode de croissance du métal et sur l'oxydation des atomes de silicium. Nous discutons ces phénomènes et suggérons qu'ils soient corrélés au caractère métallique plus ou moins marqué de la surface.
6835B - Structure of clean surfaces (reconstruction).
7320H - Impurity and defect levels; energy states of adsorbed species.
Key words
adhesion -- adsorption -- elemental semiconductors -- gold -- monolayers -- oxidation -- silicon -- silver -- surface electron states