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J. Bullot, M. Galin, M. Gauthier, B. Bourdon
J. Phys. France, 44 6 (1983) 713-721
Citations de cet article :
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Electronic and optical properties of glow-discharge amorphous silicon-carbon alloys
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Schottky barrier formation on electron beam deposited amorphous Si1−xGex: H alloys and amorphous (Si/Si1−xGex): H modulated structures
A. Christou, P. Tzanetakis, Z. Hatzopoulos, et al.
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The effects of native and light induced defects on optoelectronic properties of hydrogenated amorphous silicon–germanium (a-SiGe:H) alloy thin films
M. Güneş, M. E. D. Yavas, J. Klomfass and F. Finger
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Urbach tail and gap states in hydrogenated a-SiC and a-SiGe alloys
A. Skumanich, A. Frova and N.M. Amer
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Reactively sputtereda‐SixGe1−x:H alloys with compositional gradient in plane of film
S. Z. Weisz, M. Gomez, J. A. Muir, et al.
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Metastable Defects in the Amorphous Silicon-Germanium Alloys
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Schottky Barrier Formation on Electron Beam Deposited Amorphous Si1−xGex:H alloys and Amorphous (Si/Si1−xGex):H Modulated Structures
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A review of amorphous silicon alloys
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Direct observation of occupied gap states in amorphous Si1-xGex: H alloys by SXS
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Electrical and optical properties of hydrogenated amorphous silicon‐germanium (a‐Si1−xGex: H) films prepared by reactive ion beam sputtering
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Quantum Confinement in an Intrinsic a-Si:H Thin Film Deposited on Soda Lime Glass Substrate Using PECVD
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